Search results for "titanium nitride"
showing 10 items of 12 documents
Study of titanium alloy Ti6242S oxidation behaviour in air at 560°C: Effect of oxygen dissolution on lattice parameters
2020
Abstract High temperature oxidation of titanium alloy Ti6242S was studied in air at 560 °C up to 10000 h. Oxidation kinetics obeys a parabolic law (kp = 8.7 × 10−15 g². cm−4.s-1). Oxygen dissolution in the metal was found to represent between 80 and 90% of the total mass gain. Thin oxide scales are mainly composed of TiO2, in top of which some alumina is present. Titanium nitride was detected as a very thin layer at the outer part of the metallic substrate. Underneath, the oxygen dissolution area was found to reach the maximum brittleness after 1000 h of oxidation.
Normal Metal-Insulator-Superconductor Tunnel Junctions With Pulsed Laser Deposited Titanium Nitride as Superconductor
2021
Here we report the fabrication of normal metal – insulator – superconductor (NIS) tunnel junctions using superconducting titanium nitride grown by pulsed laser deposition (PLD). The films for NIS junction fabrication were deposited on two different substrates: silicon nitride film and magnesium oxide. TiN films were characterized by means of electrical transport measurements, and films with superconducting transition temperatures above the liquid helium boiling point were chosen for fabrication of NIS junctions. Tunnel junction devices were successfully fabricated using electron beam lithography and shadow evaporation techniques. The insulator layer formation was performed using two differe…
Curvature radius measurement by optical profiler and determination of the residual stress in thin films
2019
Abstract The Stoney formula, based on the measurement of the substrate curvature, is often used for the determination of the thin films' residual stress. In this study, titanium nitride coatings were deposited by DC reactive magnetron sputtering on silicon substrates. An optical profiler was used to determine the curvature of the surface before and after coating. Two radii were then obtained, along the principal perpendicular directions of the surface curvature. A simple and efficient method to determine the experimental error on the stress calculation was developed taking into account the film thickness dispersion and the radii dispersion. Using constant deposition parameters, some samples…
Scale composition and oxidation mechanism of the Ti–46Al–8Nb alloy in air at 700 and 800 °C
2011
It is known that the oxide scale formed on TiAl alloys is generally composed of a mixture of alumina (Al2O3) and titania (TiO2). The presence of niobium changes the activities of Ti and Al and influences the kinetics of oxidation and oxide layer composition. In this work, the Tie46Ale8Nb alloy was subjected to cyclic oxidation in air at 700 � C (for 2 and 24 h) and 800 � C (for 300 h). Scale composition was analyzed by means of different techniques including X-ray photoelectron spectroscopy, X-ray diffraction and secondary ion mass spectroscopy. The scale consisted of several layers. The outer layer was built of alumina (amorphous or with very fine grains), whereas the inner layer e mainly …
Corrosion resistance of the vacuum arc deposited Ti, TiN and TiO2 coatings on large area glass substrates
2000
An industrial installation for vacuum arc deposition is presented. Its potential in the field of decorative coatings for large area glass sheets is demonstrated. In particular it is possible to deposit patterned coatings through a polymeric textile mask. The ability to deposit uniform multilayer coatings having interference colours onto large silicate glass sheets is shown. Titanium, titanium nitride and titanium dioxide coatings on silicate glass have been characterized in terms of composition and corrosion resistance. Depth profiling was achieved with the aid of Auger electron spectroscopy. The corrosion resistance of TiN coatings is higher than that of TiO 2 . The corrosion resistance of…
Growth and Electrical Characterization of Horizontally Aligned CNTs
2009
Nickel catalyst nanoparticles acting as nucleating seeds for carbon nanotube (CNT) growth were selectively deposited on the sidewalls of titanium nitride (TiN) electrodes by electrochemical deposition (ECD) from a Ni2+ electrolyte solution. Horizontal aligned CNTs were grown selectively from the sidewalls of these TiN electrodes forming a bridging CNT contact between the electrode gaps. Current-voltage measurements demonstrated this could be a promising technique towards nanoscale interconnections and nanoelectronic devices with resistance values for the bridging CNTs as low as 300Ω.
Structural and electrical properties of magnetron sputtered Ti(ON) thin films:The case of TiN doped in situ with oxygen.
2009
International audience; Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiOxNy that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250–320nm in thickness, have been deposited by dc-pulsed magnetron reactive sputtering from Ti target under controllable gas flows of Ar, N2 and O2. Optical monitoring of Ti plasma emission line at = 500nm has been implemented in order to stabilize the sputtering rate. Scanning electron microscopy (SEM), X-ray diffraction in grazing incidence (GIXRD), micro-Raman spectroscopy, X…
New preparation of ceramic coatings by low-pressure plasma spray
2018
As an advanced thermal spray technology, low-pressure plasma spray (LPPS) allows obtaining high-quality coatings and can bridge the thickness gap between conventional thermal spray technologies and standard thin film processes. Moreover, LPPS permits to build uniform coatings with various microstructures; deposition takes place not only from liquid splats but also from nano-sized clusters as well as from the vapor phase depending on operational conditions. In order to further improve and develop the LPPS process, this research aims to combine it with the emerging suspension plasma spray and reactive plasma spray processes. It was expected to both provide two novel integrated processes and a…
Microstructural study of titanium carbonitride elaborated by combustion synthesis
2007
Abstract The self-propagating high-temperature synthesis (S.H.S.) process, which is promising for the fabrication of ceramic materials, was chosen to elaborate titanium carbonitride materials. The influence of parameters such as nitrogen gas pressure and carbon ratio on the microstructure was studied. A single phase product of Ti(C,N) is obtained for a carbon ratio under 15 at.% and a nitrogen pressure of 36 MPa. The increase of the carbon ratio corresponds to a decrease of the maximum temperature reached during the synthesis. Time resolved X-ray diffraction measurements (TRXRD) with the synchrotron radiation were used to determine the reaction mechanisms. We could observe that the synthesi…